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(CAS NO.2768-02-7) VinyltrimethoxySilane, A-171/Z-6300/KBM-1003/xl10/VTMOEO

(CAS NO.2768-02-7) VinyltrimethoxySilane, A-171/Z-6300/KBM-1003/xl10/VTMOEO

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Minimum Order

Place of Origin:

-

Price for Minimum Order:

-

Minimum Order Quantity:

1 Ton

Packaging Detail:

drum or as requested

Delivery Time:

10D(LEADTIME)

Supplying Ability:

50 Metric Ton per Month

Payment Type:

L/C, T/T

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Persona de contacto Ms. sunny

CHAOYANGDISTRICT, Beijing, Beijing

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Description

(CAS#********7) VinyltrimethoxySilane, A***1/Z****0/KBM****3/xl*0/VTMOEO
 
Other Names 
A***1 Z****0 KBM****3 Dynasylan VTMO 

CAS No. 
********7 
EINECS No.
********8 
Molecular Formula: C5H*2O3SI

 
Appearance: 
Colorless transparent liquid 
Purity: *8%MIN

boilng Point :**2 
Flash Point : *3 
melting point: **3
℃
Refractive index: 1.*****1.***5
hazard class: 3
 
Applications: 
Polymer Modification: Vinyltrimethoxysilane is used to modify polyethylene and other polymers by grafting its vinyl group to the polymer backbone using a radical initiator, such as peroxide. This provides a polymer with pendant trimethoxysilyl groups that may be used as moisture-activated crosslinking sites via hydrolysis of the alkoxy groups followed by condensation of the resulting silanols. 

Crosslinking of Silane-Grafted Polymers: 
The reaction of Silane-grafted polyethylene to form a crosslinked or vulcanized polyethylene uses water to form the crosslinks. This technology is widely used around the world for commercial applications in wire and cable insulation, tubing, and other similar uses. 
The basic reaction sequence is as follows: polyethylene is reacted (grafted) with vinyltrimethoxysilane, using a peroxide initiator, in an extruder. The grafted polyethylene is then formed into a finished product, such as cable jacketing, wire insulation, or pipe. The forming step is usually done by a second extrusion, during which a catalyst for the moisture-cure step is added. Finally, the formed article is exposed to moisture or hot water to cause hydrolysis of the Silane and condensation to form crosslinks via Si-O-Si bond formation. 


 

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