Sell DLPCB-UV 300 Both-side exposure machine EP series circuit boa

Description

1)Minimum the analytical line width: 3mil 2) Minimum resolution line space width: 3mil 3) Maximum Exposure breadth: **0mm × **0mm 4) Light source: imported UV-A band UV lamp 5) Wavelength: **5nm 6)Capacity: **0PNL / H 7)Vacuum pressure: ≤ 0.6MPa 8)Translucent materials: Industrial translucent membrane 9)Device built-in micro-controller can be programmed *0) Equipment with LCD interface, beep alarm *1)Power suppliy: **0VAC/*0Hz *2) Power: 0.2kW *3)Weight: *5kg *4) Dimensions (length / width / height): **0mm × **0mm × **0mm